In this contribution we have described and measured the dependence of the density of neutral oxygen atoms in the plasma reactor as a function coupling between plasma and RF generator that is used for plasma excitation. The discharge can be created in two different modes: in H-mode plasma is confined in a narrow area inside an excitation coil and it is characterized with very high neutral atom density, while plasma in E-mode is extended throughout the whole volume of the chamber and therefore the density of neutral atoms is smaller. The results presented in this contribution are important for optimization of the flux of atoms to the surface of the treated materials during etching processes.
COBISS.SI-ID: 24953383
In this paper we have described a method of optical emission spectroscopy, which was introduced in order to monitor the reaction products formed during treatment of polymer materials in oxygen plasma. By real-time monitoring of the reaction products, which are formed due to interaction of plasma particles with polymer material, we can get an insight into surface processes. In the case of etching and consequent removal of organic deposits from the surface, it is possible to observe a sharp drop of specific lines (like CO, OH, Na) in the optical emission spectrum.
COBISS.SI-ID: 24836647