Thermal annealing of deposited Ti/Pt layers in the temperature range of 300-700 °C was investigated revealing strong impact on the Ti/Pt resistivity. Furthermore, it was determined that temperature coefficient of resistance (TCR) for Ti/Pt temperature sensors and the heater increased with the annealing temperature. Microstructural analysis of deposited and annealed Ti/Pt layers carried out by AES and AFM revealed that recrystallization followed by grain growth process of heat treated Ti/Pt layers started at around 500 °C and correlated well with the behavior of electrical properties. Additional insulation steps of assembled microfluidic platform further reduced the power consumption, but also increased the time response of the microfluidic reactor.
COBISS.SI-ID: 8160596
The paper presents solutions for residual stress control in thin films deposition on plasma enhanced chemical vapor depositions (PECVD) reactors and some MEMS applications. The main layers analyzed are: amorphous silicon, amorphous silicon carbide and amorphous silicon nitride. The main parameters analyzed are the temperature of the deposition process, pressure, gas composition, as well as the value of the power and the power mode (high frequency - 13.56 MHz or low frequency – 400 KHz. The RF frequency mode presents a major influence of residual stress: in low frequency mode a relatively high compressive stress is achieved due to ion bombardment and, as a result, densification of the layer is achieved.
COBISS.SI-ID: 8972116
An overview of micromachining technologies for the fabrication of silicon microstructures was given. Basic micromachining technologies such as various etching methods of silicon (isotropic, anisotropic; dry, wet) and etching of other important materials (Pyrex glass etc.), anodic bonding, etc. was discussed. For an illustration of microstructures fabrication by micromachining procedures, a review of microstructures fabricated in LMSE such as micropumps and microreactors, together with their characteristics and applications, was given.
COBISS.SI-ID: 8473940