A detailed overview of activities in LMSE in the field of micromachining of silicon, glass and other compatible materials which are part of modern microelectronic sensor, actuator or/and MEMS structures was given. In addition, applications from various fields using structures designed in LMSE were presented.
B.04 Guest lecture
COBISS.SI-ID: 8470100R&D activities in LMSE with the emphasis on their applicability in Slovenian industry as well as in Slovenian craft activities were presented. The main stress was given on advanced technologies from the field of MEMS, which add values to modern microstructures, sensors and actuators.
F.18 Transfer of new know-how to direct users (seminars, fora, conferences)
COBISS.SI-ID: 11767835Investigation of Al thin films deposited by DC magnetron sputtering on n-type Si and SiO2 substrates from two different target compositions Al-1%Si and Al-1%Si-0.5%Cu was carried out. Surface morphology was studied by optical, SEM and AFM analyses as a function of sputtering in-situ preheat temperature and ex-situ annealing temperature. Grain size and hillock formation in the Al layers was found to be strongly dependent on the pre-heat temperature in the range of 373-573 K and less on the annealing temperature in the range of 573-773 K. Al-Si-Cu target composition exhibited films with lower hillock density and orthogonally packed fine grain structure.
F.18 Transfer of new know-how to direct users (seminars, fora, conferences)
COBISS.SI-ID: 8784980