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Projects / Programmes source: ARIS

Influence of non-reactive and reactive ion etching onto modification and rectructuring of polycristalline and monocrystalline metallic surfacec doped with surface active elements

Research activity

Code Science Field Subfield
2.21.00  Engineering sciences and technologies  Technology driven physics   

Code Science Field
T150  Technological sciences  Material technology 
T450  Technological sciences  Metal technology, metallurgy, metal products 
Keywords
ion etching and modelling, reactive sputtering, surface active elements, focused and broad beam, nanostructures, surface reconstructions, surface analytical techniques
Evaluation (rules)
source: COBISS
Researchers (9)
no. Code Name and surname Research area Role Period No. of publicationsNo. of publications
1.  25126  PhD Črtomir Donik  Materials science and technology  Researcher  2008 - 2011 
2.  10842  PhD Matjaž Godec  Materials science and technology  Researcher  2008 - 2011 
3.  20660  Denis Hren  Chemistry  Researcher  2008 - 2011 
4.  05675  PhD Monika Jenko  Neurobiology  Researcher  2008 - 2011 
5.  08850  PhD Djordje Mandrino  Physics  Head  2008 - 2011 
6.  21772  PhD Milorad Milun  Materials science and technology  Researcher  2008 - 2011 
7.  04253  Miroslav Pečar  Electronic components and technologies  Technical associate  2008 - 2011 
8.  16095  PhD Danijela Anica Skobir Balantič  Materials science and technology  Researcher  2008 - 2011 
9.  25498  PhD Barbara Šetina Batič  Materials science and technology  Researcher  2008 - 2011 
Organisations (1)
no. Code Research organisation City Registration number No. of publicationsNo. of publications
1.  0206  Institute of Metals and Technology  Ljubljana  5051622000 
Abstract
Demands of technology press for simple production of surface structures with dimensions in the nanodomain. Promissing technique in this regard is so called ion sculpting where ion beam etching is used to obtain lateraly ordered nanostructures. Main purpose of the project is to study the synergic effect of the ion etching induced surface modification coupled to surface restructuring due to surface active dopants and to evaluate the technologic usefulness of these effects. Additionally, reactive (Ar + O) vs non-reactive (Ar only) ion etching will be compared. In this way, set of etching and doping parameters may be estimated for reproducible production of well defined nanostructures on surfaces of technological importance (metals, thin metal film on insulator, electrical steel).
Significance for science
Contributions to already existing knowledge in the field of ion beam - surface interaction were obtained, especially where these interaction produce effects that can depend on composition and/or structure of the surface (e.g. surface active elements). Some procedures employed in ion beam nanostructuring of the surfaces have become routine, at least, at the laboratory level. Synergic effects of ion etching and surface active elements onto modification of surfaces of technological interest (like metallic, technologically meaningful alloys, thin metal films on insulators or semiconductors) may have number of technologically important applications, especially in areas where mass production of well defined nanostructures is required (nanotechnological applications, typically). Ion beam-induced nanostructuring of the surfaces was studied. Some measurements were performed that show probable synergetic effect of ion beam irradiation and surface active elements onto surface nanostructures formation. It was found that ion beam etching produces different patterns on crystallographycally different grains of a polycrystalline sample. For different ion beam parameters the surface patterns produced were classified according to morphology and their dependence on substrate's crystallographic orientation determined. Among the characteristic morphologies, when the surface active element was present, the faceted surface characteristic of surface reconstructions influenced by surface active elements appeared which shows that during ion sculpting surface active element influences the type of the surface stucture formed. Surface reconstruction on ion etched FeS was observed and explained as due to ion etching combined with surface active element (S) released from the surface. Se adsorption on Fe (110) and its role in surface reconstruction were described by DFT which is a step towards describing simultanious action by surface active element and ion beam etching.
Significance for the country
In the National Research and Development Programme for 2006 -2010 (NRDP 06-10) the following fields are specifically listed as research fields that hold special promise for Slovenia: - information and communication technologies - advanced (new) synthetic metallic and non-metallic materials and nanotechnologies - complex systems and innovative technologies - technologies for sustained economy - health and life science According to the above definitions list results of the project match the second of the research fields from the NRDP 06-10.
Most important scientific results Annual report 2008, final report, complete report on dLib.si
Most important socioeconomically and culturally relevant results Annual report 2008, 2009, final report, complete report on dLib.si
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