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Equipment source: ARIS

Focused Ion Beam (FIB)

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Purpose of equipment
Focused ion beam, shortly FIB, is a technique used in the semiconductor industry, materials science and in the biology field for site-specific analysis, deposition and ablation of materials using accelerated ions. A dual-beam setup is a scientific instrument that comprise of a scanning electron microscope (SEM) for imaging of sample surface and ion beam for etching or machining. Instrument is used for nano-pattering, TEM sample preparation, 3D tomography and deposition of thin conductive or dielectric films via ion-beam induced deposition.
Access of equipment
Responsible for equipment: PhD Goran Dražić
URL: www.nanocenter.si
first access upon agreement with responsible person, experienced operators through reservation system
Organisations (1)
no. Code Research organisation City Registration number No. of publications
1.  3050  Center of excellence on nanoscience and nanotechnology - Nanocenter, Ljubljana  Ljubljana  3666255  0 
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